Gas phase pulse etching of silicon for MEMS with Xenon Difluoride

Canadian Conference on Electrical and Computer Engineering

Volumn 3, Issue , 1999, Pages 1637-1642

  Chan, Isaac W T ^a   Brown, Keith B ^a   Lawson, Ron P W ^a   Robinson, Alexander M ^a   Ma, Yuan ^a   Strembicke, Derek ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ETCHING; FILM GROWTH; MICROELECTROMECHANICAL DEVICES; SILICON WAFERS; SURFACE ROUGHNESS; THIN FILMS;

ETCH DEPTH RATES; GAS PHASE ETCHANT; GAS PHASE PULSE ETCHING; XENON DIFLUORIDE;

XENON;

EID: 0033354701     PISSN: 08407789     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)