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Volumn 42, Issue 11, 2003, Pages 7045-7049

Thickness Dependence of Infrared Optical Properties of LaNiO3 Thin Films Prepared on Platinized Silicon Substrates

Author keywords

Infrared optical properties; Infrared spectroscopic ellipsometry (IRSE); Lanthanum nickel oxide; Thickness dependence; Thin film

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; DEPOSITION; ELLIPSOMETRY; INFRARED SPECTROSCOPY; LANTHANUM COMPOUNDS; LIGHT ABSORPTION; SILICON;

EID: 1642577037     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.7045     Document Type: Article
Times cited : (7)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.