Effects of (100)-textured LaNiO3 electrode on the deposition and characteristics of PbTiO3 thin films prepared by rf magnetron sputtering

Journal of Materials Research

Volumn 12, Issue 8, 1997, Pages 2158-2164

  Wu, Chii Ming ^a   Hong, Tian Jue ^a   Wu, Tai Bor ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; FERROELECTRIC MATERIALS; FILM PREPARATION; HYSTERESIS; LANTHANUM COMPOUNDS; LEAD COMPOUNDS; MAGNETRON SPUTTERING; PERMITTIVITY; SPUTTER DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

DIELECTRIC LOSS;

DIELECTRIC FILMS;

EID: 0031208770     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0289     Document Type: Article

References (25)

1. J. T. Evans and R. Womack, IEEE J. Solid-State Circuits 23, 1171 (1988).
2. J. F. Scott, L. Kammerdiner, M. Parris, S. Traynor, V. Ottenbacher, A. Shamabken, and W. F. Oliver, J. Appl. Phys. 64, 787 (1988).
3. P. K. Larsen, R. Cuppens, and G. A. C. M. Spierings, Ferroelectrics 128, 265 (1992).
4. M. Okuyama and Y. Hamakawa, Ferroelectrics 63, 243 (1985).
5. K. Kushida and H. Takeuchi. Appl. Phys. Lett. 50, 1800 (1987).
6. W. Y. Hsu and R. Raj. Appl. Phys. Lett. 60, 3105 (1992).
7. E. Sviridov, V. Alyoshin, Y. Golovko, I. Zakharchenko, V. Mukhortov, and V. Dudkevich, Ferroelectrics 128, 1 (1992).
8. H. N. Al-Shareef, A. I. Kingon, X. Chen, K. R. Buller, and O. Auciello, J. Mater. Res. 9, 2968 (1994).
9. D. P. Vijat and S. B. Desu, J. Electrochem. Soc. 140, 2640 (1993).
10. T. Nakamuna, Y. Nakao, A. Kamisawa, and H. Takasu, Jpn. J. Appl. Phys. 33, 5207 (1994).
11. R. Ramesh, W. K. Chan, B. Wilkens, H. Gilchrist, T. Sands, J. M. Tarascon, V. G. Keramidas, D. K. Fork, J. Lee, and A. Safari, Appl. Phys. Lett. 61, 1537 (1992).
12. A. Wold, B. Post, and E. Banks. J. Am. Chem. Soc. 70, 4911 (1957).
13. K. P. Rajeev, G. V. Shivakuma, and A. K. Raychaudhmi, Solid State Commun. 79, 591 (1991).
14. H. Ichinose, H. Katsuki, H. Takagi, and M. Nagano, J. Mater. Sci. 29, 5109 (1994).
15. H. Ichinose, M. Nagano, H. Katsuki, and H. Takagi, J. Mater. Sci. 29, 5115 (1994).
16. C. C. Yang, M. S. Chen, T. T. Hong, C.M. Wu, J. M. Wu, and T. B. Wu, Appl. Phys. Lett. 66, 2643 (1995).
17. M. J. Shyu, T. J. Hong, and T. B. Wu, Mater. Lett. 23, 221 (1995).
18. M. J. Shyu, T. J. Hong, T. J. Yang, and T. B. Wu, Jpn. J. Appl. Phys. 34, 3647 (1995).
19. M. S. Chen, J. M. Wu, and T. B. Wu, Jpn. J. Appl. Phys. 34, 4870 (1995).
20. L. G. Schulz, J. Appl. Phys. 20, 1030 (1949).
21. T. B. Wu, T. J. Hong, and M. C. Jiang, Mater. Chem. Phys. 36, 337 (1994).
22. M. C. Jiang and T. B. Wu, J. Mater. Res. 9, 1879 (1994).
23. M. C. Jiang, T. J. Hong, and T. B. Wu, Jpn. J. Appl. Phys. 33, 6301 (1994).
24. K. Abe, H. Tomita, H. Toyoda, M. Imai, and Y. Yokote, Jpn. J. Appl. Phys. 30, 2152 (1991).
25. T. Ogawa, A. Senda, and T. Kasanami, Jpn. J. Appl. Phys. 30, 2145 (1991).