Dielectric Properties of Ba(Ti0.85Zr0.15)O 3 Film Prepared by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 11, 2003, Pages 6969-6972

  Tohma, Tetsuro ^a   Masumoto, Hiroshi ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Ba(Ti.85Zr 0.15)O3; Barium titanate; Barium zirconate; Dielectric properties; Domain; Ferroelectric; Film; MOCVD; Relaxor; Scanning nonlinear dielectric microscopy

Indexed keywords

ELECTRIC FIELDS; FERROELECTRICITY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; PHASE TRANSITIONS; SUBSTITUTION REACTIONS; SUPERCONDUCTING FILMS; THERMAL EFFECTS;

SCANNING NONLINEAR DIELECTRIC MICROSCOPY;

BARIUM TITANATE;

EID: 1642495700     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.6969     Document Type: Article

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