Leakage current behavior in common I-layer A-Si:H P-I-N photodiode arrays

Materials Research Society Symposium - Proceedings

Volumn 762, Issue , 2003, Pages 271-276

  Theil, Jeremy A ^a  

^a AGILENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DIFFUSION; ELECTRIC FIELD EFFECTS; HYDROGENATION; LEAKAGE CURRENTS; SEMICONDUCTOR DOPING; SENSORS;

DIODE EDGE EFFECTS; PHOTODIODE ARRAYS;

PHOTODIODES;

EID: 1642459415     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-762-a21.4     Document Type: Conference Paper

References (12)

1. J. A. Theil, R. Snyder, D. Hula, K. Lindahl, H. Haddad, and J. Roland, J. Non-Cryst. Sol., 299, 1234 (2002).
2. J. A. Theil, M. Cao, G. Kooi, G. W. Ray, W. Greene, J. Lin, A. J. Budrys, U. Yoon, S. Ma, and H. Stork, MRS Symp. Proc., 609, A14.3.1 (2000).
3. H. Fischer, J. Schulte, P. Rieve, and M. Böhm, Mat. Res. Soc. Symp. Proc., 336, 867 (1994).
4. E. Schiff, R. A. Street, and R. L. Weisfeld, J. Non-crystalline Solids, 198 (1996) 1155.
5. R. A. Street, Appl. Phys. Lett., 57(13) 1334 (1990).
6. A. Ilie, and B. Equer, Phys. Rev. B. 57(24), 15349 (1998).
7. J. A. Theil, H. Haddad, R. Snyder, M. Zelman, D. Hula, and K. Lindahl, Proceedings of the SPIE, 4435, 206 (2001).
8. J. A. Theil, IEE Proc. Circuits, Devices, and Systems, 150(4), accepted for publication (2003).
9. J. Theil, D. Lefforge, G. Kooi, M. Cao, and G. Ray, J. Non-crystalline Solids, 266, 569 (2000).
10. R. A. Street, Hydrogenated Amorphous Silicon, Cambridge University Press: Cambridge, pp 370-372, (1991).
11. S. C. Deane, F. J. Clough, W. I. Milne, and M. J. Powell, J. Appl. Phys., 73(6), 2895 (1993).
12. K. Winer, Phys. Rev. B, 41(7), 12 150 (1990).