Mid-gap states measurements of low-level boron-doped a-Si:H films

Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 569-573

  Theil, Jeremy ^a   Lefforge, Dale ^a   Kooi, Gerrit ^a   Cao, Min ^a   Ray, Gary W ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010699380     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(99)00847-9     Document Type: Article

References (7)

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