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Volumn 762, Issue , 2003, Pages 437-442
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Effects of excitation frequency and H2 dilution on cluster generation in silane high-frequency discharges
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
DEGRADATION;
DEPOSITION;
GROUNDING ELECTRODES;
HYDROGENATION;
LIGHT SCATTERING;
MICROSTRUCTURE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REDUCTION;
SEPARATION;
SOLAR CELLS;
STAINLESS STEEL;
TRANSMISSION ELECTRON MICROSCOPY;
CLUSTER GENERATION;
LIGHT-INDUCED DEFECTS;
SILANES;
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EID: 1642459373
PISSN: 02729172
EISSN: None
Source Type: Journal
DOI: 10.1557/proc-762-a9.5 Document Type: Article |
Times cited : (4)
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References (13)
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