메뉴 건너뛰기




Volumn 43, Issue 11, 2003, Pages 1441-1443

Influence of annealing temperature on optical properties of titanium oxide thin films

Author keywords

Annealing; Mid frequency AC magnetron sputtering; Thin film optics; Titanium oxide thin film

Indexed keywords

ANNEALING; LIGHT REFLECTION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; REFRACTIVE INDEX; SPECTROPHOTOMETERS; TITANIUM OXIDES;

EID: 1642349340     PISSN: 10000054     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (1)

References (13)
  • 1
    • 0035933656 scopus 로고    scopus 로고
    • 2 thin films prepared by dc magnetron sputtering method
    • 2 thin films prepared by dc magnetron sputtering method[J]. Vacuum, 2001, 62: 361-366.
    • (2001) Vacuum , vol.62 , pp. 361-366
    • Zheng, S.K.1    Wang, T.M.2    Xiang, G.3
  • 4
    • 0030269612 scopus 로고    scopus 로고
    • Blood compatibility of titanium oxide prepared by ion-beam-enhanced deposition
    • Zhang F, Huang N, Yang P, et al. Blood compatibility of titanium oxide prepared by ion-beam-enhanced deposition[J]. Surf Coat Technol, 1996, 84: 476-479.
    • (1996) Surf. Coat. Technol. , vol.84 , pp. 476-479
    • Zhang, F.1    Huang, N.2    Yang, P.3
  • 6
    • 0032310269 scopus 로고    scopus 로고
    • Mid frequency sputtering with TwinMag - A survey of recent results
    • Brauer G, Ruske M, Szczyrbowski J, et al. Mid frequency sputtering with TwinMag - A survey of recent results[J]. Vacuum, 1998, 51(4): 655-659.
    • (1998) Vacuum , vol.51 , Issue.4 , pp. 655-659
    • Brauer, G.1    Ruske, M.2    Szcuzyrbowski, J.3
  • 7
    • 0034462356 scopus 로고    scopus 로고
    • Study on the preparation and properties of titanium oxide thin film by mid-frequency alternative reactive magnetron sputtering technique
    • Tang J., Xu C. and Li H.(ed.), Houston: SPIE
    • HOU Yaqi, ZHUANG Darning, ZHAO Daqing, et al. Study on the preparation and properties of titanium oxide thin film by mid-frequency alternative reactive magnetron sputtering technique[A]. TANG Jinfa, XU Chaonan, LI Haizhang. Advanced Photonic Sensors: Technology and Applications[C]. Houston: SPIE, 2000, 34-38.
    • (2000) Advanced Photonic Sensors: Technology and Applications , pp. 34-38
    • Hou, Y.1    Zhuang, D.2    Zhao, D.3
  • 8
    • 0031143137 scopus 로고    scopus 로고
    • Microstructure modification of amorphous titanium oxide thin films during annealing treatment
    • Martin N, Rousselot C, Rondor D, et al. Microstructure modification of amorphous titanium oxide thin films during annealing treatment[J]. Thin Solid Films, 1997, 300: 113-121.
    • (1997) Thin Solid Films , vol.300 , pp. 113-121
    • Martin, N.1    Rousselot, C.2    Rondor, D.3
  • 9
    • 0036700273 scopus 로고    scopus 로고
    • Influence of annealing temperature on the structure and surface morphology of titanium oxide thin film
    • Chinese source
    • HOU Yaqi, ZHUANG Darning, ZHANG Gong, et al. Influence of annealing temperature on the structure and surface morphology of titanium oxide thin film[J]. Vac Sci and Technol, 2002, 22(4): 247-251. (in Chinese)
    • (2002) Vac. Sci. and Technol. , vol.22 , Issue.4 , pp. 247-251
    • Hou, Y.1    Zhuang, D.2    Zhang, G.3
  • 10
    • 1642337966 scopus 로고
    • Beijing: National Defense Industry Press, Chinese source
    • LIN Yongchang, LU Weiqiang. Theory of Optical Thin Film[M]. Beijing: National Defense Industry Press, 1990: 35-50. (in Chinese)
    • (1990) Theory of Optical Thin Film , pp. 35-50
    • Lin, Y.1    Lu, W.2
  • 11
    • 0021513002 scopus 로고
    • Multiple determination of the optical constants of thin film coating materials
    • Arndt D P, Azzam R M A, Bennett J M, et al. Multiple determination of the optical constants of thin film coating materials[J]. Appl Optics, 1984, 23(20): 3571-3596.
    • (1984) Appl. Optics , vol.23 , Issue.20 , pp. 3571-3596
    • Arndt, D.P.1    Azzam, R.M.A.2    Bennett, J.M.3
  • 12
    • 0020940620 scopus 로고
    • Determination of the thickness and optical constants of amorphous silicon
    • Swanepoel R. Determination of the thickness and optical constants of amorphous silicon[J]. J Phys E: Sci Instrum, 1983, 16: 1214-1222.
    • (1983) J. Phys. E: Sci. Instrum. , vol.16 , pp. 1214-1222
    • Swanepoel, R.1
  • 13
    • 0343022269 scopus 로고    scopus 로고
    • Thickness dependence of the optical properties of sputter deposited Ti oxide films
    • Rodriguez J, Gomez M, Ederth J, et al. Thickness dependence of the optical properties of sputter deposited Ti oxide films[J]. Thin Solid Films, 2000, 365: 119-125.
    • (2000) Thin Solid Films , vol.365 , pp. 119-125
    • Rodriguez, J.1    Gomez, M.2    Ederth, J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.