Influence of annealing temperature on the structure and surface morphology of titanium oxide thin film

Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology

Volumn 22, Issue 4, 2002, Pages 247-251

  Hou, Yaqi ^a   Zhuang, Daming ^a   Zhang, Gong ^a   Zhao, Ming ^a   Wu, Minsheng ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Anatase; Mid frequency alternative magnetron sputtering; Rutile; TiO2 thin film

Indexed keywords

ANNEALING; GRAIN SIZE AND SHAPE; MICROSTRUCTURE; MORPHOLOGY; SURFACES; THIN FILMS;

ANATASE; MIDFREQUENCY ALTERNATIVE MAGNETRON SPUTTERING; RUTILE;

TITANIUM DIOXIDE;

EID: 0036700273     PISSN: 02539748     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. 2 Films on Glass. Surface and Coating Technology, 2000, 123:268
2. 2 Thin Films Prepared by Sputtering Applied Catalysis B: Environmental, 2000, 25:83
3. Brauer G, Ruske M, Szczyrbowski J et al. Mid Frequency Sputtering with TwinMag-a Survey of Recent Results. Vacuum, 1998, 51(4):655
4. Hou Yaqi, Zhuang Daming, Zhao Daqing et al. In:Tang Jinfa, Xu Chaonan, Li Haizhang eds. Advanced Photonic Sensors: Technology and Applications. Houston:SPIE, 2000, 4220:34
5. Martin N, Rousselot C, Rondor D et al. Microstructure Modification of Amorphous Titanium Oxide Thin Films During Annealing Treatment Thin Solid Films, 1997, 300:113
6. Meng L J,dos Santos M P. The Effect of Substrate Temperauture on the Properties of Sputtered Titanium Oxide Films. Applied Surface Science, 1993, 65:235
7. 2-x Thin Films. Applied Surface Science, 1993, 65:227
8. 2 Films Prepared by Sputtering and Evaporation Thin Solid Films, 1994, 251:72