Nanoimprint lithography of chromophore molecules under high-vacuum conditions

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 185-188

  Pisignano, Dario ^a,b   Melcarne, Angelo ^a   Mangiullo, Diego ^a   Cingolani, Roberto ^a   Gigli, Giuseppe ^a  

^a NATIONAL NANOTECHNOLOGY LABORATORY   (Italy)

^b UNIVERSITY OF SALENTO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; DYES; ELECTRON BEAM LITHOGRAPHY; PHOTOLITHOGRAPHY; PHOTOLUMINESCENCE; PHOTONS; POLYMER BLENDS; POLYMETHYL METHACRYLATES; QUANTUM EFFICIENCY; QUENCHING; SCANNING ELECTRON MICROSCOPY; THERMOPLASTICS;

NANOIMPRINT LITHOGRAPHY (NIL); PHOTOLUMINESCENCE EFFICIENCY;

CHROMOPHORES;

EID: 1642280053     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1641056     Document Type: Conference Paper

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