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Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques

Volumn 96, Issue 3, 2005, Pages 259-268

Current understanding of annealing texture evolution in thin films and interconnects

(1) Lee, Dong Nyung a

a Seoul National University (South Korea)

Author keywords

Annealing textures; Electrodeposits; Electroless deposits; Interconnects; Vapor deposits

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRODEPOSITION; ELECTROLESS PLATING; GRAIN GROWTH; INTERFACIAL ENERGY; RECRYSTALLIZATION (METALLURGY); STRESSES; TEXTURES;

DISLOCATION ENERGY; INTERCONNECTS; STRESS ANISOTROPY; VAPOR DEPOSITS;

THIN FILMS;

EID: 16244419760 PISSN: 00443093 EISSN: None Source Type: Journal
DOI: 10.3139/146.101029 Document Type: Article

Times cited : (19)

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