메뉴 건너뛰기




Volumn 41, Issue 6, 2005, Pages 368-370

DC broken down MOSFET model for circuit reliability simulation

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; ELECTRIC INVERTERS; EQUIVALENT CIRCUITS; SHORT CIRCUIT CURRENTS;

EID: 16244415902     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20057422     Document Type: Article
Times cited : (10)

References (10)
  • 1
    • 0036712470 scopus 로고    scopus 로고
    • The impact of gate oxide breakdown on SRAM stability
    • Rodriguez, R., et al.: 'The impact of gate oxide breakdown on SRAM stability', IEEE Electron Device Lett., 2002, 23, (9), pp. 559-561
    • (2002) IEEE Electron Device Lett. , vol.23 , Issue.9 , pp. 559-561
    • Rodriguez, R.1
  • 2
    • 0036494245 scopus 로고    scopus 로고
    • Impact MOSFET gate oxide breakdown on digital circuit operation and reliability
    • Kaczer, B., et al.: 'Impact MOSFET gate oxide breakdown on digital circuit operation and reliability', IEEE Trans. Electron Devices, 2002, 49, (3), pp. 500-506
    • (2002) IEEE Trans. Electron Devices , vol.49 , Issue.3 , pp. 500-506
    • Kaczer, B.1
  • 3
    • 0032231207 scopus 로고    scopus 로고
    • Influence of MOS transistor gate oxide breakdown on circuit performance
    • Yeoh, T.S.: 'Influence of MOS transistor gate oxide breakdown on circuit performance'. IEEE Int. Conf. on Semiconductor Electronics, 1998 pp. 59-63
    • (1998) IEEE Int. Conf. on Semiconductor Electronics , pp. 59-63
    • Yeoh, T.S.1
  • 4
    • 0037972834 scopus 로고    scopus 로고
    • Collapse of MOSFET drain current after soft breakdown and its dependence on the transistor aspect ratio W/L
    • Cester, A., et al.: 'Collapse of MOSFET drain current after soft breakdown and its dependence on the transistor aspect ratio W/L'. Proc. IRPS, 2003pp. 189-195
    • (2003) Proc. IRPS , pp. 189-195
    • Cester, A.1
  • 5
    • 0032661176 scopus 로고    scopus 로고
    • Influence of soft breakdown on NMOSFET device characteristics
    • Pompl, T., et al.: 'Influence of soft breakdown on NMOSFET device characteristics'. Proc. IRPS, 1999, pp. 82-87
    • (1999) Proc. IRPS , pp. 82-87
    • Pompl, T.1
  • 6
    • 0037973058 scopus 로고    scopus 로고
    • Effect of gate oxide breakdown on RF device and circuit performance
    • Yang, H., Yuan, J.S., and Xiao, E.: 'Effect of gate oxide breakdown on RF device and circuit performance'. Proc. IRPS, 2003, pp. 1-4
    • (2003) Proc. IRPS , pp. 1-4
    • Yang, H.1    Yuan, J.S.2    Xiao, E.3
  • 8
  • 9
    • 0345201638 scopus 로고    scopus 로고
    • A function-fit model for the soft breakdown failure mode
    • Miranda, E., et al.: 'A function-fit model for the soft breakdown failure mode', IEEE Electron Device Lett., 1999, 20, pp. 265-267
    • (1999) IEEE Electron Device Lett. , vol.20 , pp. 265-267
    • Miranda, E.1
  • 10
    • 0034994978 scopus 로고    scopus 로고
    • Relation between breakdown mode and breakdown location in short channel nMOSFETs and its impact on reliability specifications
    • Degraeve, R., et al.: 'Relation between breakdown mode and breakdown location in short channel nMOSFETs and its impact on reliability specifications'. Proc. IRPS, 2001, pp. 360-366
    • (2001) Proc. IRPS , pp. 360-366
    • Degraeve, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.