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Volumn , Issue , 2001, Pages 360-366
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Relation between breakdown mode and breakdown location in short channel NMOSFETs and its impact on reliability specifications
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Author keywords
Hard breakdown; Oxide reliability; Soft breakdown
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Indexed keywords
ANNEALING;
ELECTRIC BREAKDOWN;
GATES (TRANSISTOR);
MOSFET DEVICES;
OPTIMIZATION;
RELIABILITY;
SEMICONDUCTOR GROWTH;
VOLTAGE MEASUREMENT;
HARD BREAKDOWN;
SHORT CHANNEL NMOSFETS;
SOFT BREAKDOWN;
SEMICONDUCTOR DEVICE TESTING;
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EID: 0034994978
PISSN: 00999512
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (69)
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References (16)
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