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Volumn 5539, Issue , 2004, Pages 126-132

Fabrication of collimators for gamma-ray imaging

Author keywords

Collimator; Deep x ray lithography; Gold plating; High aspect ratio; LIGA; SU 8

Indexed keywords

ASPECT RATIO; ELECTROFORMING; GAMMA RAYS; IMAGING SYSTEMS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT; X RAY LITHOGRAPHY;

EID: 15844396413     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.563748     Document Type: Conference Paper
Times cited : (9)

References (12)
  • 5
    • 0001351569 scopus 로고
    • Tables of X-ray mass attenuation coefficients and mass energy-absorption coefficients 1 keV to 20 MeV for elements Z=1 to 92 and 48 additional substances of dosimetric interest
    • J. H. Hubbell and S. M. Seltzer. "Tables of X-Ray Mass Attenuation Coefficients and Mass Energy-Absorption Coefficients 1 keV to 20 MeV for Elements Z=1 to 92 and 48 Additional Substances of Dosimetric Interest", National Institute of Standards and Technology, NISTIR 5632 (1995); http://physics.nist.gov/PhysRefData/XrayMassCoef/cover.html
    • (1995) National Institute of Standards and Technology, NISTIR , vol.5632
    • Hubbell, J.H.1    Seltzer, S.M.2
  • 7
    • 10844252198 scopus 로고    scopus 로고
    • Improvements in graphite-based x-ray mask fabrication for ultra-deep x-ray lithography
    • accepted
    • R. Divan, D.C. Mancini, S.M. Gallagher, J. Booske, D. Weide. "Improvements in graphite-based x-ray mask fabrication for ultra-deep x-ray lithography", Microsystem Technol. (2004) accepted.
    • (2004) Microsystem Technol.
    • Divan, R.1    Mancini, D.C.2    Gallagher, S.M.3    Booske, J.4    Weide, D.5
  • 8
    • 0036734816 scopus 로고    scopus 로고
    • A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist
    • C.H.Lin, G.B. Lee, B.W. Chang, G.L. Chang. "A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist". J. Micromech. Microeng. 12 590-597, 2002.
    • (2002) J. Micromech. Microeng. , vol.12 , pp. 590-597
    • Lin, C.H.1    Lee, G.B.2    Chang, B.W.3    Chang, G.L.4
  • 9
    • 0030400199 scopus 로고    scopus 로고
    • Beamline and station for deep x-ray lithography at the Advanced Photon Source
    • B. Lai, D.C. Mancini, W. Yun, and E. Gluskin. "Beamline and station for deep x-ray lithography at the Advanced Photon Source", Proc. SPIE 2880 171-76, 1996.
    • (1996) Proc. SPIE , vol.2880 , pp. 171-176
    • Lai, B.1    Mancini, D.C.2    Yun, W.3    Gluskin, E.4
  • 10
    • 0035047214 scopus 로고    scopus 로고
    • Fabrication of two-dimensional x-ray anti-scatter grids for mammography
    • K.Fischer, B.Chadburi, H.Guckel, CM.Tang. "Fabrication of two-dimensional x-ray anti-scatter grids for mammography", Proc. SPIE 4145 227-234, 2000.
    • (2000) Proc. SPIE , vol.4145 , pp. 227-234
    • Fischer, K.1    Chadburi, B.2    Guckel, H.3    Tang, C.M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.