메뉴 건너뛰기




Volumn 103, Issue 1-2, 2003, Pages 182-186

Microfabrication of freestanding metal structures using graphite substrate

Author keywords

Antiscatter grid; Graphite substrate; High aspect ratio; LIGA; MEMS; Microstructure release

Indexed keywords

ADHESION; ELECTROFORMING; FABRICATION; GRAPHITE; MEDICAL IMAGING; POLYMETHYL METHACRYLATES; SILICON; SUBSTRATES;

EID: 0037438922     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(02)00333-3     Document Type: Conference Paper
Times cited : (19)

References (11)
  • 2
    • 0000932559 scopus 로고    scopus 로고
    • Enhanced adhesion buffer layer for deep X-ray lithography using hard X-rays
    • F. DeCarlo, J.J. Song, D.C. Mancini, Enhanced adhesion buffer layer for deep X-ray lithography using hard X-rays, J. Vac. Sci. Technol. B 16 (1998) 3539-3542.
    • (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3539-3542
    • Decarlo, F.1    Song, J.J.2    Mancini, D.C.3
  • 6
    • 0030400199 scopus 로고    scopus 로고
    • Beamline and station for deep X-ray lithography at the advanced photon source
    • B. Lai, D.C. Mancini, W. Yun, E. Gluskin, Beamline and station for deep X-ray lithography at the advanced photon source, Proc. SPIE 2880 (1996) 171-176.
    • (1996) Proc. SPIE , vol.2880 , pp. 171-176
    • Lai, B.1    Mancini, D.C.2    Yun, W.3    Gluskin, E.4
  • 7
    • 0001365509 scopus 로고    scopus 로고
    • X-ray fabrication of nonorthogonal structures using 'surface' masks
    • V. White, C. Herdey, D.D. Denton, J. Song, X-ray fabrication of nonorthogonal structures using 'surface' masks, J. Vac. Sci. Technol. B 15 (1997) 2514-2516.
    • (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 2514-2516
    • White, V.1    Herdey, C.2    Denton, D.D.3    Song, J.4
  • 8
    • 0343431393 scopus 로고    scopus 로고
    • Evaluation of alternative development process for high-aspect-ratio poly(methylmethacrylate) microstructures in deep X-ray lithography
    • C.H. Malek, S. Yajamanyam, Evaluation of alternative development process for high-aspect-ratio poly(methylmethacrylate) microstructures in deep X-ray lithography, J. Vac. Sci. Technol. B 18 (2000) 3354.
    • (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 3354
    • Malek, C.H.1    Yajamanyam, S.2
  • 9
    • 0012605766 scopus 로고    scopus 로고
    • Use of graphite substrates for deep X-ray lithography
    • HARMST, Baden-Baden, Germany, June 17-19
    • D.C. Mancini, N. Moldovan, O.V. Makarova, A.G. Peele, T.H.K. Irving, Use of graphite substrates for deep X-ray lithography, Book of Abstracts, HARMST, Baden-Baden, Germany, June 17-19, 2001, p. 175.
    • (2001) Book of Abstracts , pp. 175
    • Mancini, D.C.1    Moldovan, N.2    Makarova, O.V.3    Peele, A.G.4    Irving, T.H.K.5
  • 10
    • 0036124164 scopus 로고    scopus 로고
    • Microfabrication of freestanding metal structures released from graphite substrates
    • IEEE MEMS, Las Vegas, NE, USA, January 20-24
    • O.V. Makarova, C.-M. Tang, D.C. Mancini, N. Moldovan, R. Divan, D.G. Ryding, R.H. Lee, Microfabrication of freestanding metal structures released from graphite substrates, Technical Digest, IEEE MEMS, Las Vegas, NE, USA, January 20-24, 2002, pp. 400-402.
    • (2002) Technical Digest , pp. 400-402
    • Makarova, O.V.1    Tang, C.-M.2    Mancini, D.C.3    Moldovan, N.4    Divan, R.5    Ryding, D.G.6    Lee, R.H.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.