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Fabrication and metrology of high-NA imaging optics for the EUV micro-exposure tool (MET)
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J. S. Taylor, G. E. Sommargren, D. W. Phillion, S. L. Baker, D. W. Sweeney, E. M. Gullikson, U. Dinger, G. Seitz, F. Eisert, P. Kuerz, S. Burkart, M. Weiser, S. Schulte, S. Stacklies, R. M. Hudyma, P. Gabella, Fabrication and metrology of high-NA imaging optics for the EUV micro-exposure tool (MET), Proc. SPIE 4688 (2002)
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rd International workshop on EUV Lithography, Matsue, Japan (2001), paper O 4-1
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Dinger, U.7
Seitz, G.8
Kuerz, P.9
Hudyma, R.M.10
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