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Volumn 5533, Issue , 2004, Pages 20-26

EUV- microlithography - A challenge for optical metrology

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; ERROR ANALYSIS; IMAGING SYSTEMS; INTERFEROMETERS; INTERFEROMETRY; OPTICAL VARIABLES MEASUREMENT; PROJECTION SYSTEMS; ULTRAVIOLET RADIATION;

EID: 15744380381     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.556317     Document Type: Conference Paper
Times cited : (12)

References (8)
  • 1
    • 11144354521 scopus 로고    scopus 로고
    • Fabrication and Metrology of diffraction limited soft x-ray optics for the EUV microlithography
    • in press
    • Udo Dinger, Guenther Seitz, Stefan Schulte, Frank Eisert, Christian Muenster, Stefan Burkart, Siegfried Stacklies, Christian Bustaus, et al, Fabrication and Metrology of diffraction limited soft x-ray optics for the EUV microlithography, Proc SPIE 5193 (2003), in press
    • (2003) Proc SPIE , vol.5193
    • Dinger, U.1    Seitz, G.2    Schulte, S.3    Eisert, F.4    Muenster, C.5    Burkart, S.6    Stacklies, S.7    Bustaus, C.8
  • 3
    • 0000222824 scopus 로고    scopus 로고
    • Phase shifting diffraction interferometry for measuring ultraviolet optics
    • Gary E. Sommargren, Phase Shifting Diffraction Interferometry for Measuring Ultraviolet Optics, OSA TOPS on Extreme Ultraviolet Lithography, 1996 Vol 4.
    • (1996) OSA TOPS on Extreme Ultraviolet Lithography , vol.4
    • Sommargren, G.E.1
  • 5
    • 0035162428 scopus 로고    scopus 로고
    • Interferometric testing of optical surfaces at its current limit
    • ISSN 0030-4026
    • Bernd Dörband, Günther Seitz: Interferometric testing of optical surfaces at its current limit, International Journal for Light and Electron Optics, ISSN 0030-4026, 2001; Issue 112/9, S. 392
    • (2001) International Journal for Light and Electron Optics , Issue.9-112 , pp. 392
    • Dörband, B.1    Seitz, G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.