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Volumn 86, Issue 3, 2005, Pages 299-308
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Characterization of TiO2 deposited on textured silicon wafers by atmospheric pressure chemical vapour deposition
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Author keywords
Antireflective coatings; Atmospheric pressure chemical vapour deposition (APCVD); Texturization; Titanium dioxide
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Indexed keywords
AMORPHOUS FILMS;
ANTIREFLECTION COATINGS;
ATMOSPHERIC PRESSURE;
CHEMICAL VAPOR DEPOSITION;
TEXTURES;
TITANIUM DIOXIDE;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
ANATASE CRYSTALS;
ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION (APCVD);
TEXTURED SILICON WAFERS;
TEXTURIZATION;
SILICON WAFERS;
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EID: 15744373871
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.solmat.2004.07.011 Document Type: Article |
Times cited : (29)
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References (12)
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