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Volumn 86, Issue 3, 2005, Pages 299-308

Characterization of TiO2 deposited on textured silicon wafers by atmospheric pressure chemical vapour deposition

Author keywords

Antireflective coatings; Atmospheric pressure chemical vapour deposition (APCVD); Texturization; Titanium dioxide

Indexed keywords

AMORPHOUS FILMS; ANTIREFLECTION COATINGS; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; TEXTURES; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 15744373871     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2004.07.011     Document Type: Article
Times cited : (29)

References (12)
  • 9
    • 0007465957 scopus 로고
    • S.C. Bailar, H.J. Eneleus, A.F. Trofman-Dickenson (Eds.), Pergamon Press, Oxford
    • R.J.H Clark, in: S.C. Bailar, H.J. Eneleus, A.F. Trofman-Dickenson (Eds.), Comprehensive Inorganic Chemistry, Pergamon Press, Oxford, 1973, p. 375
    • (1973) Comprehensive Inorganic Chemistry , pp. 375
    • Clark, R.J.H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.