Rapid thermal annealing applied to the optimization of titanium oxide arc

Materials Science in Semiconductor Processing

Volumn 1, Issue 3-4, 1998, Pages 331-334

  Lemiti, M ^a   Boyeaux, J P ^a   El Omari, H ^a   Kaminski, A ^a   Laugier, A ^a  

^a UNIVERSITÉ DE LYON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346308919     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00027-4     Document Type: Article

References (14)

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