Resistance changes due to thermal coalescence in colloidal Au/organic linker molecule multilayer films

Journal of Physical Chemistry B

Volumn 109, Issue 9, 2005, Pages 3715-3718

  Supriya, Lakshmi ^a   Claus, Richard O ^a  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METAL COLLOIDS; MONOLAYER PROTECTED CLUSTERS (MPC); MULTILAYER FILMS; THERMAL COALESCENCE;

ALCOHOLS; COALESCENCE; COLLOIDS; CONDUCTIVE FILMS; METALLIC FILMS; MULTILAYERS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

GOLD;

EID: 15544373264     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp044321z     Document Type: Article

References (29)

1. Tan, B. J.; Sherwood, P. M. A.; Klabunde, K. J. Langmuir 1990, 6, 105.
2. Doron, A.; Katz, E.; Willner, I. Langmuir 1995, 11, 1313.
3. Fan, H.; Lopez, G. P. Langmuir 1997, 13, 119.
4. Nagayama, N.; Itagaki, K.; Yokoyama, M. Adv. Mater. 1997, 9, 71.
5. Mayya, K. S.; Sastry, M. Langmuir 1998, 14, 6344.
6. Park, S.-H.; Im, M. J.-H.; Im, J.-W.; Chun, B.-H.; Kim, J.-H. Microchem. J. 1999, 63, 71.
7. Suyal, G.; Mennig, M.; Schmidt, H. J. Mater. Sci. 2003, 38, 1645.
8. Solecka-Cermakova, K.; Vlckova, B.; Lednicky, F. J. Phys. Chem. 1996, 100, 4954.
9. Grabar, K. C.; Freeman, R. G.; Hommer, M.; Natan, M. J. Anal. Chem. 1995, 67, 735.
10. Halperin, W. P. Rev. Mod. Phys. 1986, 58, 533.
11. Henglein, A. J. Phys. Chem. 1993, 97, 5457.
12. Schmitt, J.; Mächtle, P.; Eck, D.; Möhwald, H.; Helm, C. A. Langmuir 1999, 15, 3256.
13. Lyon, A. V.; Musick, M. D.; Smith, P. C.; Reiss, B. D.; Pena, D. J.; Natan, M. J. Sens. Actuators, B: Chem. 1999, B54, 118.
14. Natan, M. J.; Lyon, L. A. In Metal Nanoparticles; Feldheim, D. L.; Foss, C. A., Jr., Eds.; Marcel Dekker: New York, 2002; p 183.
15. Angel, S. M.; Myrick, M. L.; Milanovich, F. P. Appl. Spectrosc. 1990, 44, 335.
16. Aroca, R.; Scraba, M.; Mink, J. Spectrochim. Acta, Part A: Mol. Biomol. Spectrosc. 1991, 47, 263.
17. Ahern, A. M. Garrell, R. L. Langmuir 1988, 4, 1162.
18. Musick, M. D.; Keating, C. D.; Keefe, M. H.; Natan, M. J. Chem. Mater. 1997, 9, 1499.
19. Musick, M. D.; Keating, C. D.; Lyon, L. A.; Botsko, S. T.; Peña, D. J.; Holliway, W. D.; McEvoy, T.; Richardson, J. N.; Natan, M. J. Chem. Mater. 2000, 12, 2869.
20. Brown, K. R.; Lyon, L. A.; Fox, A. P.; Reiss, B. D.; Natan, M. J. Chem. Mater. 2000, 12, 314.
21. Wuelfling, W. P.; Zamborini, F. P.; Templeton, A. C.; Wen, X.; Yoon, H.; Murray, R. W. Chem. Mater. 2001, 13, 87.
22. Supriya, L.; Claus, R. O. Langmuir 2004, 20, 8870.
23. Using an average value of R = 50 Ω for the resistance, and the area A of the film = 1 cm (width) × 108 nm (thickness), and length l = 1 cm, the resistivity (ρ) after heating was computed using the formula, ρ = RA/l.
24. Castner, D. J.; Hinds, K.; Grainger, D. W. Langmuir 1996, 12, 5083.
25. Ishida, T.; Choi, N.; Mizutani, W.; Tokumoto, H.; Kojima, I.; Azehara, H.; Hokari, H.; Akiba, U.; Fujihara, M. Langmuir 1999, 15, 6799.
26. Lee, M.-T.; Hsueh, C.-C.; Freund, M. S.; Ferguson, G. S. Langmuir 1998, 14, 6419.
27. Delamarche, E.; Michel, B.; Kang, H.; Greber, Ch. Langmuir 1994, 10, 4103.
28. Kodama, C.; Hayashi, T.; Nozoye, H. Appl. Surf. Sci. 2001, 169-170, 264.
29. Kondoh, H.; Kodama, C.; Sumida, H.; Nozoye, H. J. Chem. Phys. 1999, 111, 1175.