Porous organosilicates low-dielectric films for high-frequency devices

Journal of Electronic Materials

Volumn 33, Issue 2, 2004, Pages 135-140

  Knoesen, André ^a   Song, Ge ^a   Wolksen, Willi ^b   Huang, Elbert ^b   Magbitang, Teddie ^b   Sundberg, Linda ^a   Hedrick, James L ^b   Hawker, Craig J ^b   Miller, Robert D ^b  

^a University of California   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Dielectric films; Dielectric measurements; Nanoporous films; Permittivity measurement; Transmission line measurements

Indexed keywords

DIELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; NANOSTRUCTURED MATERIALS; PERMITTIVITY; PERMITTIVITY MEASUREMENT; POROUS MATERIALS; SILICATES; THIN FILMS;

DIELECTRIC INTERMETAL INSULATOR; HIGH FREQUENCY DEVICES; LOW DIELECTRIC FILMS; POLYMETHYL SILSESQUIOXANE; POROUS ORGANOSILICATES; TRANSMISSION LINE MEASUREMENTS;

DIELECTRIC FILMS;

EID: 1542336718     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-004-0283-7     Document Type: Article

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