A Successful Failure Analysis Using Front and Backside Fault Localization Techniques on a Deep Sub-micron CMOS Device

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2001, Pages 305-311

  Yamada, Yoshiteru ^a   Komoda, Hirotaka ^a  

^a RICOH COMPANY LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRON BEAMS; FAILURE ANALYSIS; IMAGING TECHNIQUES; ION BEAMS; LIQUID CRYSTALS; MICROSCOPIC EXAMINATION; SILICON;

EMISSION MICROSCOPY; FAULT LOCALIZATION TECHNIQUES; OPTICAL BEAM INDUCED CURRENT (OBIC);

CMOS INTEGRATED CIRCUITS;

EID: 1542330625     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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