Ternary TiAlGe ohmic contacts for p-type 4H-SiC

Journal of Applied Physics

Volumn 95, Issue 4, 2004, Pages 2187-2189

  Sakai, T ^a   Nitta, K ^a   Tsukimoto, S ^a   Moriyama, M ^a   Murakami, Masanori ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC RESISTANCE; GERMANIUM; ISOTHERMS; LEAKAGE CURRENTS; MORPHOLOGY; OHMIC CONTACTS; SUBSTRATES; THERMAL CONDUCTIVITY; THERMODYNAMIC STABILITY; TITANIUM COMPOUNDS;

GERMANIUM TITANIUM ALUMINIDE; SPECIFIC CONTACT RESISTANCE;

SILICON CARBIDE;

EID: 1542306762     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1643772     Document Type: Article

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