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Materials Transactions

Volumn 43, Issue 7, 2002, Pages 1684-1688

Low resistance TiAl Ohmic contacts with multi-layered structure for p-type 4H-SiC

(4) Nakatsuka, Osamu a Takei, Tomonori a Koide, Yasuo a Murakami, Masanori a

a NAGOYA UNIVERSITY (Japan)

Author keywords

Aluminum; Carbide; Ohmic contact; Silicide; Silicon carbide; Titanium

Indexed keywords

AGGLOMERATION; CRYSTAL MICROSTRUCTURE; ELECTRIC RESISTANCE; INTERFACES (MATERIALS); OHMIC CONTACTS; RAPID THERMAL ANNEALING; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

MULTI-LAYERED STRUCTURES;

TITANIUM ALLOYS;

EID: 0036630880 PISSN: 13459678 EISSN: None Source Type: Journal
DOI: 10.2320/matertrans.43.1684 Document Type: Article

Times cited : (39)

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