Morphological and mechanical properties study of [WO3/W] n nanoscale multilayers

Thin Solid Films

Volumn 479, Issue 1-2, 2005, Pages 201-206

  Maille L ^a   Sant, C ^a   Aubert, P ^a   Garnier, P ^a  

^a UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

Author keywords

Morphology; Nanoindentation; Oxygen resputtering; WO3 W multilayers

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; ELASTIC MODULI; INDENTATION; MULTILAYERS; NANOSTRUCTURED MATERIALS; OXIDATION; OXYGEN; PLASTIC DEFORMATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

FRICTION COEFFICIENT; NANOINDENTATION; OXYGEN RESPUTTERING; X-RAY REFLECTIVITY (XRR);

TUNGSTEN COMPOUNDS;

EID: 15344346244     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.203     Document Type: Article

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