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Volumn 169-170, Issue , 2003, Pages 27-31
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Preparation of high quality strontium titanate based thin films by ECR plasma sputtering
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Author keywords
(Ba, Sr)TiO3; Crystallization; Dielectric constant; ECR sputtering; SrTiO3
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Indexed keywords
ANNEALING;
CRYSTALLIZATION;
PERMITTIVITY;
PLASMAS;
SILICON;
SPUTTER DEPOSITION;
SUBSTRATES;
THIN FILMS;
MILLIMETER-WAVE ANNEALING;
STRONTIUM COMPOUNDS;
COATING;
FILM;
PLASMA TREATMENT;
QUALITY CONTROL;
STRONTIUM;
SURFACE TREATMENT;
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EID: 0037793256
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(03)00059-8 Document Type: Article |
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Times cited : (16)
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References (11)
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