Preparation and characterization of low pressure chemically vapor deposited silicon nitride thin films from tris(diethylamino)chlorosilane and ammonia

Thin Solid Films

Volumn 479, Issue 1-2, 2005, Pages 137-143

  Liu, Xue Jian ^a   Chen, Yao Feng ^b   Li, Hui Li ^a   Sun, Xing Wei ^a   Huang, Li Ping ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Characterization; Liquid precursor; Low pressure chemical vapor deposition; Silicon nitride

Indexed keywords

AMMONIA; CARBON; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; SILICON NITRIDE;

HOT WALL TUBULAR RECTORS; LIQUID PRECURSORS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

THIN FILMS;

EID: 15344340455     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.201     Document Type: Article

References (26)

1. A.K. Stamper, and S.L. Pennington J. Electrochem. Soc. 140 1993 1748
2. A.J. Lowe, M.J. Powell, and S.R. Elliott J. Appl. Phys. 59 1986 1251
3. I. Kobayashi, T. Ogawa, and S. Hotta Jpn. J. Appl. Phys. 31 1992 336
4. T. Kim, and K. Ohnishi Electron. Commun. Jpn. 74 1991 63
5. L.S. Zambom, and R.D. Mansano Vacuum 71 2003 439
6. J. Hong, W.M.M. Kessels, W.J. Soppe, A.W. Weeber, W.M. Arnoldbik, and M.C.M. Sanden J. Vac. Sci. Technol., B 21 2003 2123
7. G. Beshkov, S. Lei, V. Lazarova, N. Nedev, and S.S. Georgiev Vacuum 69 2003 301
8. J.L. Dupuie, E. Gulari, and F. Terry J. Electrochem. Soc. 139 1992 1151
9. S.M. Sze VLSI technology 1988 McGraw-Hill Book New York 268
10. M. Gupta, V.K. Rathi, R. Thangaraj, O.P. Agnihotri, and K.S. Chari Thin Solid Films 204 1991 77
11. S.S. Han, B.H. Jun, K. No, and B.S. Bae J. Electrochem. Soc. 145 1998 652
12. A. Kikkawa, R. Morimoto, A. Izumi, and H. Matsumura Thin Solid Films 430 2003 100
13. J.M. Grow, R.A. Levy, X. Fan, and M. Bhaskaran Mater. Lett. 23 1995 187
14. R.A. Levy, X. Lin, J.M. Grow, H.J. Boeglin, and R. Shalvoy J. Mater. Res. 11 1996 1483
15. R.G. Gordon, D.M. Hoffman, and U. Riaz Chem. Mater. 2 1990 480
16. B.J. Burger, and J.E. Bercaw A.L. Wayda M.Y. Darensbourg Experimental organometallic chemistry ACS Symposium Series vol. 357 1987 American Chemical Society Washington, DC
17. X.J. Liu, J.J. Zhang, X.W. Sun, Y.B. Pan, L.P. Huang, and C.Y. Jin Thin Solid Films 460 2004 72
18. A. Hozumi, H. Inagai, Y. Yokogawa, and T. Kameyama Thin Solid Films 437 2003 89
19. C.J. Jenks, T.E. Bloomer, M.J. Kramer, T.A. Lograsso, D.W. Delaney, A.R. Ross, D.J. Scordelet, M.F. Besser, and P.A. Thiel Appl. Surf. Sci. 180 2001 57
20. A.K. Sinha, H.J. Levinstein, T.E. Smith, G. Quintana, and S.E. Haszko J. Electrochem. Soc. 125 1978 601
21. R.A. Levy, D.J. Resnick, R.C. Frye, A.W. Yanof, G.M. Wells, and F. Cerrina J. Vac. Sci. Technol., B 6 1988 154
22. E. Kobeda, M. Kellam, and C.M. Osburn J. Electrochem. Soc. 138 1991 1846
23. J. Singh, and R.C. Budhanj Appl. Phys. Lett. 51 1987 978
24. K. Yasui, H. Katoh, K. Komaki, and S. Kaneda Appl. Phys. Lett. 56 1990 898
25. W.A. Lanford, and M.J. Rand J. Appl. Phys. 49 1978 2473
26. D.E. Kotecki, and J.D.C. Sokoi J. Appl. Phys. 77 1995 1284