SCOPUS 정보 검색 플랫폼

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 1, 2005, Pages 193-198

State-of-the-art of focused ion beam nanolithography

Author keywords

Dry etching; EDS; Focused ion beams; Nanolithography; NERIME process; TEM

Indexed keywords

DEFORMATION; DRY ETCHING; ENERGY DISPERSIVE SPECTROSCOPY; IMAGE PROCESSING; IMAGING TECHNIQUES; INTEGRATED CIRCUITS; ION BEAM LITHOGRAPHY; OXIDATION; TRANSMISSION ELECTRON MICROSCOPY;

ION ACCELERATION ENERGIES; NEGATIVE RESIST IMAGE BY DRY ETCHING (NERIME); PATTERN DEFORMATION; SELECTIVE MATERIAL REMOVAL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 15244339889 PISSN: 14544164 EISSN: None Source Type: Journal
DOI: None Document Type: Conference Paper

Times cited : (9)

References (14)

1
- 0000882045
- J. Melngailis, J. Vac. Sci. Techol. B5(2), 469 (1987).
- (1987) J. Vac. Sci. Techol. , vol.B5 , Issue.2 , pp. 469
- Melngailis, J.¹

2
- 0035766920
- R. Gerlach, M. Utlaut, Proc. SPIE Charged Particles Detection, Diagnostics, and Imaging, Vol. 4510, 2001, p.96.
- (2001) Proc. SPIE Charged Particles Detection, Diagnostics, and Imaging , vol.4510 , pp. 96
- Gerlach, R.¹ Utlaut, M.²

3
- 1842422565
- D. Ferranti, A. Graupera, J. Marshman, D. Stewart, S. Szelag, Proc. SPIE 23rd Annual BACUS Symposium on Photomask Technology, Vol. 5256, p.546, 2003.
- (2003) Proc. SPIE 23rd Annual BACUS Symposium on Photomask Technology , vol.5256 , pp. 546
- Ferranti, D.¹ Graupera, A.² Marshman, J.³ Stewart, D.⁴ Szelag, S.⁵

4
- 0030231711
- K. Gamo, Microelectronics Engineering 32, 159 (1996).
- (1996) Microelectronics Engineering , vol.32 , pp. 159
- Gamo, K.¹

5
- 0023005157
- H. Morimoto, Y. Sasaki, K. Saitoh, Y. Watakabe, T. Kato, Microelectronics Engineering 4, 163 (1986).
- (1986) Microelectronics Engineering , vol.4 , pp. 163
- Morimoto, H.¹ Sasaki, Y.² Saitoh, K.³ Watakabe, Y.⁴ Kato, T.⁵

6
- 0141432443
- S. Matsui, K. Mon, K. Saigo, T. Shiokawa, K. Toyoda, S. Namba, J. Vac. Sci. Technol, B4(4), 845 (1986).
- (1986) J. Vac. Sci. Technol , vol.B4 , Issue.4 , pp. 845
- Matsui, S.¹ Mon, K.² Saigo, K.³ Shiokawa, T.⁴ Toyoda, K.⁵ Namba, S.⁶

7
- 0025414661
- S. Matsui, Y. Kojima, Y. Ochiai, Microelectronics Engineering 11, 427 (1990).
- (1990) Microelectronics Engineering , vol.11 , pp. 427
- Matsui, S.¹ Kojima, Y.² Ochiai, Y.³

8
- 0141655452
- M. Harthey, D. Shaver, M. Shepard, J. Melngailis, V. Medvedev, W. Robinson, J. Vac. Sci. Technol. B9(6), 3432 (1991).
- (1991) J. Vac. Sci. Technol. , vol.B9 , Issue.6 , pp. 3432
- Harthey, M.¹ Shaver, D.² Shepard, M.³ Melngailis, J.⁴ Medvedev, V.⁵ Robinson, W.⁶

9
- 0021375413
- H. Kuwano, J. Appl. Phys. 55(4), 1149 (1984).
- (1984) J. Appl. Phys. , vol.55 , Issue.4 , pp. 1149
- Kuwano, H.¹

10
- 0020127608
- I. Adesida, Nuclear Instruments and Methods 209-210, 79 (1983).
- (1983) Nuclear Instruments and Methods , vol.209-210 , pp. 79
- Adesida, I.¹

11
- 0038021006
- K. Arshak, M. Mihov, D. Sutton, A. Arshak, S. B. Newcomb, Microelectronic Engineering 67-68, 130 (2003).
- (2003) Microelectronic Engineering , vol.67-68 , pp. 130
- Arshak, K.¹ Mihov, M.² Sutton, D.³ Arshak, A.⁴ Newcomb, S.B.⁵

12
- 1642359706
- K. Arshak, M. Mihov, A. Arshak, D. McDonagh, D. Sutton, S. B. Newcomb, J. Vac. Sci. Technol. B22(1), 189 (2004).
- (2004) J. Vac. Sci. Technol. , vol.B22 , Issue.1 , pp. 189
- Arshak, K.¹ Mihov, M.² Arshak, A.³ McDonagh, D.⁴ Sutton, D.⁵ Newcomb, S.B.⁶

13
- 0042731882
- K. Arshak, M. Mihov, A. Arshak, D. McDonagh, D. Sutton, S. Newcomb, T. J. Kinsella, Proc. SPIE Opto Ireland 2002, Vol.4876, 2003, p.525.
- (2003) Proc. SPIE Opto Ireland 2002 , vol.4876 , pp. 525
- Arshak, K.¹ Mihov, M.² Arshak, A.³ McDonagh, D.⁴ Sutton, D.⁵ Newcomb, S.⁶ Kinsella, T.J.⁷

14
- 9644273766
- K. Arshak, M. Mihov, A. Arshak, D. McDonagh, D. Sutton, Proc. 13 Int. Conf. on Photopolymers IBM RETEC 2003, 2003, p46.
- (2003) Proc. 13 Int. Conf. on Photopolymers IBM RETEC 2003 , pp. 46
- Arshak, K.¹ Mihov, M.² Arshak, A.³ McDonagh, D.⁴ Sutton, D.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.