Fabrication of hologram coins using electron beam lithography

Microelectronic Engineering

Volumn 71, Issue 2, 2004, Pages 171-176

  Leech, Patrick W ^a   Sexton, Brett A ^a   Marnock, Russell J ^a   Smith, Fiona ^a  

^a CSIRO   (Australia)

Author keywords

Diffractive grating structures; Electron beam lithography; Hologram coin; Replication

Indexed keywords

CHEMICAL BONDS; DIFFRACTION GRATINGS; HOLOGRAMS; INTERFEROMETRY; LIGHT INTERFERENCE; MICROSTRUCTURE; NICKEL; PLASTIC FILMS; QUARTZ; THIN FILMS;

DIFFRACTIVE GRATING STRUCTURES; HOLOGRAM COIN; IMPACT LOADING; REPLICATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0347601899     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2003.09.007     Document Type: Article

References (6)

1. B. Valentine, P.W. Leech, B.A. Sexton, R.J. Marnock, F. Smith, Proceedings of the Mint Director's Conference, Osaka, April, 2002.
2. Lee R.A. Microelectron. Eng. 53:2000;513-516.
3. Lee R.A. The Optically Variable Device (OVD) as an anti-counterfeiting Feature. 1998;Interpol 75th Anniversary Publication, Kensington Publications. pp. 98-101.
4. Leech P.W., Sexton B.A., Marnock R.J. Microelectron. Eng. 60:2002;339-346.
5. Antler M. Thin Solid Films. 84:1981;245.
6. Buckley D.H. Thin Solid Films. 53:1978;271.