Microfabrication by electrochemical metal removal

IBM Journal of Research and Development

Volumn 42, Issue 5, 1998, Pages 655-669

  Datta, M ^{a,b,c,d,e,f,g,h,i}  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b UNIVERSITY OF CONNECTICUT   (United States)

^c HARCOURT BUTLER TECHNOLOGICAL INSTITUTE   (India)

^d UNIVERSITY OF CALIFORNIA   (United States)

^e EPFL   (Switzerland)

^f IBM   (United States)

^g Intl Society of Electrochemistry   (United States)

^h ELECTROCHEMICAL SOCIETY   (United States)

ⁱ Technology Implementation Group   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENT DISTRIBUTION; ELECTROCHEMISTRY; MASS TRANSFER; SURFACE PROPERTIES;

METAL REMOVAL;

MICROELECTRONIC PROCESSING;

EID: 0032162749     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.425.0655     Document Type: Article

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