Redox-active monolayers on nano-scale silicon electrodes

Nanotechnology

Volumn 16, Issue 2, 2005, Pages 257-261

  Zhao, Qian ^a   Luo, Yong ^a   Surthi, Shyam ^a   Li, Qiliang ^a   Mathur, Guru ^a   Gowda, Srivardhan ^a   Larson, P R ^b   Johnson, M B ^b   Misra, Veena ^a  

^a North Carolina State University   (United States)

^b University of Oklahoma   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTANCE; ETCHING; MASKS; MONOLAYERS; SILICON;

NANO-MASK FABRICATION; QUANTUM CELLULAR AUTOMATA; REDOX VOLTAGES; WAFER CLEANING;

NANOSTRUCTURED MATERIALS;

EID: 14044272698     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/2/013     Document Type: Article

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