Ideally ordered anodic porous alumina mask prepared by imprinting of vacuum-evaporated Al on Si

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 11 B, 2001, Pages

  Masuda, Hideki ^a   Yasui, Kenji ^a   Sakamoto, Yasuhisa ^b   Nakao, Masashi ^b   Tamamura, Toshiaki ^b   Nishio, Kazuyuki ^a  

^a TOKYO METROPOLITAN UNIVERSITY   (Japan)

^b NTT CORPORATION   (Japan)

Author keywords

Anodic porous alumina; Dot array; Dry etching; Hole array; Imprinting; Si; Vacuum evaporation

Indexed keywords

ADHESION; ALUMINUM; ATOMIC FORCE MICROSCOPY; DRY ETCHING; EVAPORATION; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; SILICON WAFERS; SUBSTRATES; SURFACES;

ANODIC POROUS ALUMINA; DOT ARRAY; HOLE ARRAY; IMPRINTING; VACUUM EVAPORATION;

ALUMINA;

EID: 0035891955     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l1267     Document Type: Letter

References (11)