P+ structural layers for microelectromechanical systems using spin-on dopants

Sensor Letters

Volumn 2, Issue 3-4, 2004, Pages 211-216

  Proctor, Steve P ^a   Crain, Mark M ^b   Walsh, Kevin M ^b  

^a University of Louisville ^*  (United States)

^b UNIVERSITY OF LOUISVILLE   (United States)

Author keywords

Microelectromechanical systems (MEMS); P+ Etch stop; Spin on dopant

Indexed keywords

BORON; ELECTRIC RESISTANCE MEASUREMENT; ETCHING; ION IMPLANTATION; MATHEMATICAL MODELS; SILICON WAFERS; THERMAL DIFFUSION;

ETHYLENEDIAMINE PYROCATECHOL; SHEET RESISTANCE MEASUREMENT; SPIN-ON DOPANT;

MICROELECTROMECHANICAL DEVICES;

EID: 13844281400     PISSN: 1546198X     EISSN: None     Source Type: Journal    
DOI: 10.1166/sl.2004.044     Document Type: Article

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