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Journal of Microelectromechanical Systems

Volumn 10, Issue 4, 2001, Pages 532-537

Fabrication of ultrathin p++ silicon microstructures using ion implantation and boron etch-stop

(2) Huang, Chunchieh b Najafi, Khalil a,c

a IEEE

b LUCENT TECHNOLOGIES (United States)

c UNIVERSITY OF MICHIGAN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; FABRICATION; ION IMPLANTATION; PIEZOELECTRIC DEVICES; RAPID THERMAL ANNEALING; SEMICONDUCTING SILICON;

PIEZORESISTIVE SOUND DETECTORS;

MICROELECTROMECHANICAL DEVICES;

EID: 0035605866 PISSN: 10577157 EISSN: None Source Type: Journal
DOI: 10.1109/84.967376 Document Type: Article

Times cited : (17)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.