Deposition of poly crystalline thin films with controlled grain size

Journal of Physics D: Applied Physics

Volumn 38, Issue 3, 2005, Pages 490-496

  Vopsaroiu, M ^a   Fernandez, G Vallejo ^a   Thwaites, M J ^b   Anguita, J ^b   Grundy, P J ^c   O'Grady, K ^a  

^a UNIVERSITY OF YORK   (United Kingdom)

^b Plasma Quest Limited   (United Kingdom)

^c UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLOGRAPHY; DEPOSITION; GRAIN SIZE AND SHAPE; IMAGING TECHNIQUES; MAGNETIC ANISOTROPY; MICROSTRUCTURE; MOLECULAR BEAM EPITAXY; POLYCRYSTALLINE MATERIALS; SPUTTERING; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

CONTROLLED GRAIN SIZE; CRYSTALLOGRAPHIC TEXTURE; NANOMETER SCALE; SEED LAYERS;

THIN FILMS;

EID: 13844257001     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/3/022     Document Type: Article

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