Evolution of grain structure of as-deposited Cr thin films with deposition temperature

Scripta Materialia

Volumn 48, Issue 8, 2003, Pages 1161-1166

  Park, J K ^a   Kim, J H ^a   Park, S I ^b   Lee, H M ^a   Oh, D Y ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

Grain growth; Lognormal distribution; Monte Carlo simulation; Physical vapor deposition; Thin film

Indexed keywords

CHROMIUM; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; FILM GROWTH; GRAIN GROWTH; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MONTE CARLO METHODS; PHYSICAL VAPOR DEPOSITION;

LOGNORMAL DISTRIBUTION;

THIN FILMS;

EID: 0037437265     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(02)00584-5     Document Type: Article

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