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Volumn 27, Issue 5, 2005, Pages 915-919

Influence of Er concentration on the emission properties of Er-doped Si-rich silica films obtained by reactive magnetron co-sputtering

(5) Carrada, M a Gourbilleau, F a Dufour, C a Levalois, M a Rizk, R a

a CNRS (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); DOPING (ADDITIVES); HYDROGEN; LIGHT AMPLIFIERS; MAGNETRON SPUTTERING; OPTOELECTRONIC DEVICES; PHOTOLUMINESCENCE; QUENCHING; SILICA; SILICON; SYNTHESIS (CHEMICAL); THIN FILMS;

ERBIUM EMISSION; NANOCLUSTERS; REACTIVE MAGNETRON CO-SPUTTERING; SILICON-RICH SILICON OXIDE (SRSO);

ERBIUM;

EID: 13444306582 PISSN: 09253467 EISSN: None Source Type: Journal
DOI: 10.1016/j.optmat.2004.08.035 Document Type: Conference Paper

Times cited : (12)

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