SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium Proceedings

Volumn 812, Issue , 2004, Pages 153-158

Structural and functional characterization of W-Si-N sputtered thin films for copper metallizations

(7) Vomiero, Alberto a Frabboni, Stefano b Marchi, Enrico Boscolo a,c Quaranta, Alberto a,c Della Mea, Gianantonio a,c Mariotto, Gino c Felisari, Laura b

a LABORATORI NAZIONALI DI LEGNARO (Italy)

b UNIVERSITY OF MODENA AND REGGIO EMILIA (Italy)

c UNIVERSITY OF TRENTO (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LITHOGRAPHY; METALLIZING; MORPHOLOGY; NITROGEN; PARTIAL PRESSURE; SCANNING ELECTRON MICROSCOPY; SEGREGATION (METALLOGRAPHY); SPUTTER DEPOSITION; SPUTTERING; SURFACES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ABSORBANCE SPECTRA; AMORPHOUS STRUCTURE; FILM THICKNESS; X-RAY LITHOGRAPHY;

TUNGSTEN COMPOUNDS;

EID: 12944280919 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-812-f3.10 Document Type: Conference Paper

Times cited : (2)

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