Phase diagram and microstructure of microcrystalline and amorphous silicon: A numerical growth simulation

Materials Research Society Symposium Proceedings

Volumn 808, Issue , 2004, Pages 221-226

  Bailat, Julien ^a   Vallat Sauvain, Evelyne ^a   Vallat, André ^a   Shah, Arvind ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTALLINE MATERIALS; MICROSTRUCTURE; MORPHOLOGY; OPTIMIZATION; PHASE DIAGRAMS; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

FILM THICKNESS; NUMERICAL GROWTH; SIMULATED LAYERS; SURFACE EVOLUTION;

AMORPHOUS SILICON;

EID: 12844272950     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-808-a5.3     Document Type: Conference Paper

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