Process improvement and reliability characteristics of spin-on poly-3-hexylthiophene thin-film transistor

Journal of the Electrochemical Society

Volumn 152, Issue 1, 2005, Pages

  Wang, Shuo Cheng ^a   Lou, Jen Chung ^a   Liou, Bo Lin ^a   Lin, Ron Xion ^a   Yeh, Ching Fa ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CURING; DEGRADATION; LEAKAGE CURRENTS; ORGANIC POLYMERS; RELIABILITY; SOLVENTS; SPIN COATING; STRESSES; THERMAL EFFECTS; THRESHOLD VOLTAGE; VACUUM APPLICATIONS;

CHLOROFORM; GATE BIAS STRESS; ORGANIC THIN-FILM TRANSISTORS (OTFT); POLY-3-HEXYLTHIOPHENE (P3HT);

THIN FILM TRANSISTORS;

EID: 12744274658     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1829417     Document Type: Article

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