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Journal of the Korean Physical Society

Volumn 45, Issue SUPPL., 2004, Pages

Stress behavior related to the boron and nitrogen concentration of W-B-N thin films on Si substrate

(1) Lee, Chang Woo a

a Kookmin University (South Korea)

Author keywords

Interdiffusion; N 2 partial pressure ratio; Resistivity; Stress behavior; W B N thin film

Indexed keywords

EID: 12744250269 PISSN: 03744884 EISSN: None Source Type: Journal
DOI: None Document Type: Conference Paper

Times cited : (1)

References (15)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.