Microcharacterization of liquid delivery metalorganic chemical vapor deposition processed thin film materials exhibiting giant magnetoresistance

Journal of Materials Research

Volumn 14, Issue 5, 1999, Pages 2007-2011

  Weaver, M L ^a,d   Brandao, L P M ^a,e   Garmestani, H ^a   Gillman, E S ^b   Dahmen, K H ^b   Morrone, A ^c  

^a FAMU FSU COLLEGE OF ENGINEERING   (United States)

^b FLORIDA STATE UNIVERSITY   (United States)

^c University of Florida   (United States)

^d University of Alabama   (United States)

^e MILITARY INSTITUTE OF ENGINEERING   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; LANTHANUM COMPOUNDS; MAGNETORESISTANCE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; ZIRCONIA;

FILM THICKNESS; GIANT MAGNETORESISTANCE; POLYCRYSTALLINE FILM; YTTRIUM STABILIZED ZIRCONIA;

MAGNETIC THIN FILMS;

EID: 0032677242     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0271     Document Type: Article

References (16)

1. S. Jin, T. H. Tiefel, M. McCormack, R. A. Fastnacht, R. Ramesh, and L. H. Chen, Science 264, 413-415 (1994).
2. C. H. Chen and S. W. Cheong, Phys. Rev. Lett. 76, 4042 (1996).
3. R. von Helmholt, J. Wecker, B. Holzapfel, L. Schultz, and K. Samwer, Phys. Rev. Lett. 71, 2231-2334 (1993).
4. G. J. Snyder, R. Hiskes, S. DiCarolis, M. R. Beasley, and T. H. Geballe, Phys. Rev. B 53, 14434-14444 (1996).
5. H. Y. Hwang, S. W. Cheong, P. G. Radaelli, M. Marezio, and B. Batlogg, Phys. Rev. Lett. 75, 914-917 (1995).
6. H. van Santen and G. H. Jonker, Physica 16, 599 (1950).
7. H. van Santen and G. H. Jonker, Physica 16, 337 (1950).
8. E. O. Wollan and W. C. Koehler, Phys. Rev. 100, 545 (1955).
9. B. S. Kwak, Phys. Rev. Lett. 68 (25), 3733 (1992).
10. E. S. Gillman, M. Carris, C, Smith, and K. H. Dahmen, in Chemical Vapor Deposition - Proceedings of the Fourteenth International Conference and EUROCVD-11, edited by M. D. Allendorf and C. Bernard (The Electrochemical Society, Pennington, NJ, 1997), p. 1506.
11. K-H. Dahmen and M. W. Carris, Chem. Vapor Deposition (Adv. Mater.) 3, 27-30 (1997).
12. K. H. Dahmen and M. W. Carris, J. Alloys and Compd. 251, 270-277 (1997).
13. J. J. Heremans, M. Carris, S. Watts, X. Yu, K. H. Dahmen, and S. VonMolnar, J. Appl. Phys. 81 (1997).
14. L. G. Schultz, J. Appl. Phys. 20, 1030 (1949).
15. J. Kallend, U. F. Kocks, A. D. Rollett, and H-R. Wenk, Mater. Sci. Eng. A132, 1-11 (1991).
16. E. S. Gillman, M. Li, and K-H. Dahmen, J. Appl. Phys., in press.