Measurement technique for the evaluation of residual stress in epitaxial thin film by asymmetric X-ray diffraction

Journal of the Ceramic Society of Japan

Volumn 107, Issue 7, 1999, Pages 606-610

  Uchida, Hiroshi ^a   Kiguchi, Takanori ^a   Saiki, Atsushi ^a   Wakiya, Naoki ^a   Ishizawa, Nobuo ^a   Shinozaki, Kazuo ^a   Mizutani, Nobuyasu ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Asymmetric X ray diffraction; Epitaxial thin film; Lead titanate; MOCVD; Residual stress

Indexed keywords

LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; RESIDUAL STRESSES; SPATIAL VARIABLES MEASUREMENT; STRONTIUM COMPOUNDS; SUBSTRATES; THERMAL EXPANSION; X RAY DIFFRACTION;

ASYMMETRIC X RAY DIFFRACTION; DISPLACE MEASUREMENT TECHNIQUE; EPITAXIAL THIN FILM;

THIN FILMS;

EID: 0033155670     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.107.606     Document Type: Article

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