Ti and Fe cathode sputtering by the glow discharge plasma

Vacuum

Volumn 70, Issue 2-3, 2003, Pages 275-284

  Wronski Z ^a   Sielanko, J ^a   Herec J ^a  

^a MARIA CURIE SK ODOWSKA UNIVERSITY   (Poland)

Author keywords

Glow discharge; Plasma sputtering

Indexed keywords

CATHODES; COMPOSITION; IONS; PLASMA APPLICATIONS; THIN FILMS;

PLASMA SPUTTERING;

GLOW DISCHARGES;

EID: 12244286086     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00655-3     Document Type: Conference Paper

References (21)

1. Min K., Suzuki Y., Mitsuhashi R., Inoue M., Shimizu R., Hohman S. Jpn J Appl Phys. 35:1996;221.
2. Miyagawa Y., Nakao S., Saitoh K., Ikeyama M., Tanemura S., Miyagawa S. Nucl Instrum Methods. 106:1995;170.
3. Olsson M.K., Macek K., Helmersson U., Hjorvarsson B. J Vac Sci Technol. 16(A):1998;639.
4. Yang C., Ingeneri K., Mohill M., Harrison W.W. J Anal At Spectrom. 15:2000;73.
5. Wroński Z. J Phys D. 33:2000;414.
6. Phelps A.V., Petrović Z.Lj. Plasma Sources Sci Technol. 8:1999;R21.
7. Donko Z. Phys Rev E. 64:2001;026401.
8. Wroński Z., Sullivan J.L., Pearce C.G. J Phys D. 27:1994;533.
9. Webb RP, Wilson JH. Proceeding of the 2nd International Conference Simulation of Semiconductor Devices and Processes, Swansea, UK, 1986.
10. Sielanko J., Szyszko W. Nucl Instrum Methods. 16:1986;240.
11. Matsunami N.et al. Atomic Data Nucl Data Tables. 31:1984;1.
12. Sigmund P. Phys Rev. 184:1969;383.
13. Zaporozschenko V.I., Stepanova M.G., Vojtusik S.S. Vacuum. 47:1996;421.
14. Eckstein W., Hou M., Shulga V.I. Nucl Instrum Methods. 115(B):1996;478.
15. Perry A.J., Manory R.R., Novak R., Rafaja D. Vacuum. 49:1998;89.
16. Lide DR. Handbook of Chemistry, Physics 77th edition, 1996-97.
17. Bogaerts A., Gijbels R. J Anal Spectrom. 15:2000;1191.
18. Nyberg T., Skytt P., Galnander B., Nender C., Nordgren J., Berg S. J Vac Sci Technol. 15(A):1997;145.
19. Lagreid N., Wehner G.K. J Apple PhDs. 32:1961;365.
20. Waijsenfeld CH. Philp Res Rep Supp 2, 1967.
21. Bader M, Witteborn FC, Snouse TW. Nassa Tech Rep R105 1961.