Selective SiO2/Si3N4 etching in magnetized inductively coupled C4F8 plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 500-506

  Lee, Ho Jun ^a,d   Kim, Joong Kyun ^a   Kim, Jung Hun ^a   Whang, Ki Woong ^a   Kim, Jeong Ho ^b   Joo, Jung Hoon ^c  

^a Seoul National University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

^c Kunsan National University   (South Korea)

^d KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744308350     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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