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Volumn 14, Issue 3, 1996, Pages 1062-1066

Study of radiation damage and contamination by magnetized inductively coupled plasma etching

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EID: 5844360321 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.580134 Document Type: Article

Times cited : (10)

References (15)

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