The relation between phase transformation and onset of thermal degradation in nanoscale CoSi 2-polycrystalline silicon structures

Journal of Applied Physics

Volumn 96, Issue 12, 2004, Pages 7568-7573

  Van Dal, M J H ^a   Jawarani, D ^b   Van Berkum, J G M ^a   Kaiser, M ^a   Kittl, J A ^c   Vrancken, C ^d   De Potter, M ^d   Lauwers, A ^d   Maex, K ^d  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b FREESCALE SEMICONDUCTOR INC   (United States)

^c TEXAS INSTRUMENTS   (Belgium)

^d IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

LINEWIDTH; POLYSILICON LINES; SHEET RESISTANCE; SILICON STRUCTURES;

AGGLOMERATION; COBALT COMPOUNDS; ION IMPLANTATION; NITROGEN; NUCLEATION; PHASE TRANSITIONS; POLYSILICON; PYROLYSIS;

POLYCRYSTALLINE MATERIALS;

EID: 11044238778     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1815384     Document Type: Article

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