SCOPUS 정보 검색 플랫폼

Volumn 85, Issue 22, 2004, Pages 5412-5414

Fabrication of a metal-oxide-semiconductor-type capacitive microtip array using SiO2 or HfO2 gate insulators

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC INSULATORS; ETCHING; FABRICATION; GATES (TRANSISTOR); HAFNIUM COMPOUNDS; OXIDATION; SCANNING ELECTRON MICROSCOPY; SILICA; THERMAL EFFECTS;

ATOMIC LAYER DEPOSITION (ALD); CAPACITIVE MICROTIP ARRAYS; GATE INSULATORS;

MOS CAPACITORS;

EID: 11044227628 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1828226 Document Type: Article

Times cited : (3)

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