Highly (001)-textured WS2-x films prepared by reactive radio frequency magnetron sputtering

Physica Status Solidi (A) Applied Research

Volumn 201, Issue 14, 2004, Pages

  Ellmer, K ^a   Mientus, R ^b   Seeger, S ^a   Weiss V ^a,c  

^a HAHN MEITNER INSTITUT   (Germany)

^b Opto Transmitter Umweltschutz Technologie eV   (Germany)

^c INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOVOLTAIC EFFECTS; VAN DER WAALS FORCES; X RAY DIFFRACTION;

EXCITATION FREQUENCY; FILM STRAIN; PLASMA EXCITATION; SUBSTRATE SURFACE;

TUNGSTEN COMPOUNDS;

EID: 10944270750     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200409067     Document Type: Article

References (18)

1. H. Tributsch, Ber. Bunsenges. Phys. Chem. 81, 362 (1977).
2. E. Bucher, in: Photoelectrochemistry and Photovoltaics of Layered Semiconductors, edited by A. Aruchamy (Kluwer Academic Publ., Dordrecht, 1992), p. 1.
3. E. Galun, H. Cohen, L. Margulis, A. Vilan, T. Tsirlina, G. Hodes, R. Tenne, M. Hershfinkel, W. Jaegermann, and K. Ellmer, Appl. Phys. Lett. 67, 3474 (1995).
4. M. Regula, C. Ballif, M. Remskar, and F. Levy, J. Vac. Sci. Technol. A 15, 2323 (1997).
5. K. Ellmer, C. Stock, K. Diesner, and I. Sieber, J. Cryst. Growth 182, 389 (1997).
6. S. Tiefenbacher, H. Sehnert, C. Pettenkofer, and W. Jaegermann, Surf. Sci. Lett. 318, L1161 (1994).
7. K. Ellmer, R. Mientus, V. Weiß, and H. Rossner, Meas. Sci. Technol. 14, 336 (2003).
8. W. Bohne, J. Röhrich, and G. Röschert, Nucl. Instrum. Methods Phys. Res. B 136-138, 633 (1998).
9. V. Weiß, R. Mientus, and K. Ellmer, Mater. Res. Soc. Symp. Proc. 721, 131 (2002).
10. J. A. Thornton and D. W. Hoffman, Thin Solid Films 171, 5 (1989).
11. E. Benavente, M. A. S. Ana, F. Mendizabal, and G. Gonzalez, Coord. Chem. Rev. 224, 87 (2002).
12. A. Oberlin and G. Terriere, J. de Microscopic 18, 247 (1973).
13. J. Moser and F. Levy, Thin Solid Films 240, 56 (1994).
14. I. F. Brunnell, L. Pichon, N. Hellgren, Z. Czigany, J. Neidhardt, and L. Hultman, Philos. Mag. Lett. 84, 395 (2004).
15. J. W. Otto, J. K. Vassiliou, and G. Frommeyer, Phys. Rev. B 57, 3264 (1998).
16. J. P. Biersack and W. Eckstein, Appl. Phys. A 34, 73 (1984).
17. D. K. Brice, J. Y. Tsao, and S. T. Picraux, Nucl. Instrum. Methods Phys. Res. B 44, 68 (1989).
18. I. Petrov, F. Adibi, J. E. Greene, L. Hultman, and J.-E. Sundgren, Appl. Phys. Lett. 63, 36 (1993).