Thermal nitridation kinetics of silicon wafers in nitrogen atmosphere during annealing

Thin Solid Films

Volumn 474, Issue 1-2, 2005, Pages 326-329

  Zhu, Hongliang ^a,b   Yang, Deren ^b   Wang, Lei ^b   Due, Duanlin ^b  

^a Zhejiang University of Sciences   (China)

^b ZHEJIANG UNIVERSITY   (China)

Author keywords

Nitrogen; Silicon nitride; Thermal nitridation; Thin films

Indexed keywords

DIFFUSION; GROWTH KINETICS; NITROGEN; OPTICAL MICROSCOPY; REACTION KINETICS; X RAY PHOTOELECTRON SPECTROSCOPY;

HOT FILAMENTS; OXIDATION MASKS; ROUGH VACUUM; THERMAL NITRIDATION;

SILICON WAFERS;

EID: 10844295844     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.09.006     Document Type: Article

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