|
|
Volumn 394, Issue 1-2, 2001, Pages 108-113
|
|
Preparation and characterization of smooth and dense silicon nitride thin films
a
a
a
|
|
Author keywords
Magnetron sputtering; Silicon nitride; Smooth and dense; X Ray reflectivity
|
|
Indexed keywords
CARRIER MOBILITY;
COMPOSITION;
DENSITY (SPECIFIC GRAVITY);
ELECTRON MOBILITY;
FILM PREPARATION;
ION BOMBARDMENT;
MAGNETRON SPUTTERING;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PRESSURE EFFECTS;
SILICON NITRIDE;
SUBSTRATES;
SURFACE ROUGHNESS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ENERGETIC PARTICLES;
THIN FILMS;
|
|
EID: 0035881404
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/s0040-6090(01)01171-3 Document Type: Article |
|
Times cited : (5)
|
|
References (15)
|
